Alpine Research Optics is dedicated to providing superior products through technical research and innovation. Our engineers and scientists are active participants in conferences and technical societies, and frequently author articles and conference presentations discussing advances in the field. The following is a partial list of articles:

ARTICLES

New generation of applications raises performance bar for scanning mirrors
By David Collier and Rod Schuster, published in Laser Focus World, June 2006

Designers must understand the various fabrication trade-offs when specifying custom optics for demanding scanning systems. This article reviews the most important of these.


ULTRAFAST OPTICS: Coatings and optics expand ultrafast laser applications
By David Kemp, Ph.D. and Rod Schuster, published in Laser Focus World, August 2005

Ultrafast laser systems require coatings that minimize the effects of group velocity dispersion (GVD) and spectral distortion. This article reviews these types of coatings, and also examines two new types of optics developed to support ultrafast applications.


How to buy UV optics
By David Collier and Rod Schuster, published in Opto-Laser Europe, April 2005

This article provides guidance on how to choose and specify the most economical UV optics that will perform properly within a given application.


Superpolishing Deep - UV Optics
By David Collier and Rod Schuster,  published in Photonics Spectra, February, 2005

Superpolishing of substrates can yield optics with both superior performance and longer lifetime. However, there are substantial difficulties associated with superpolishing UV-compatible crystalline materials such as CaF2 and MgF2. Read about the latest developments in superpolishing technology in this Photonics Spectra article by ARO's David Collier and Rod Schuster.


Obtaining High Flatness Optics
By David Kemp, Ph.D. and Wayne Pantley, published in Laser Focus World, August 2003

Many vendors currently offer optics with a flatness of λ/10 or better. However, flatness specifications often only apply to the substrate prior to coating, and mechanical stress in a thin film coating can warp a component substantially out of shape. Environmental factors, such as temperature and humidity, also affect part shape. Because of these reasons, performance specifications for many off-the-shelf optics fail to tell the whole story.


Prospering through the downturn
By David Collier, published in Laser Focus World, January 2003

ARO President David Collier describes how the company prospered through an economic downturn by focusing on delivering premium performance products to a diverse range of niche applications.


Taking the UV CHALLENGE
By Wayne Pantley and David Collier, published in OEMagazine, October 2002

This article gives an overview of the difficulties involved in UV optics fabrication, and examines some of the issues being faced as applications, such as microlithography, LASIK and FBG, writing press towards the use of shorter laser wavelengths (especially 157 nm) and higher output powers.


Know the trade-offs when specifying mirrors
By Wayne Pantley, David Kemp, Ph.D. and David Collier, published in Laser Focus World, October 2001

Consumers often don’t fully comprehend the meaning of all the various parameters used to specify a mirror. This article reviews the most important mirror specifications and their relationship to cost and performance.


157 nm Optics: Meeting The Critical Challenge Of Contamination
By James Doty, Ph.D., published in Photonics Tech Briefs, January 2001

High absorption losses at 157 nm demand that optics at this wavelength must meet new surface contamination standards. This article discusses how and why both manufacturers and end-users address this problem.


Damage Control: A Practical Guide To Avoiding Laser Damage To Optics
By James Doty, Ph.D., published in Photonics Spectra, November 2000

In real world laser applications, the true sources of optical damage are often misdiagnosed. This article provides important practical advice on the diagnosis and elimination of damage sources. The text also includes a useful primer on optical cleaning techniques.


Precision Opto-Mechanical Assemblies Benefit System Builders
By Wayne Pantley and Dave Collier, published in Laser Focus World, June 2000

The performance of laser optics can be easily compromised by poor mounting techniques. However, a number of straightforward techniques have been developed to avoid such problems.


Deep UV Applications Challenge Optical Fabrication
By Wayne Pantley and Dave Collier, published in Photonics Tech Briefs, May 1999

Microlithography and other important applications are driving a growing demand for deep-UV laser systems. Suppliers of OEM optics are supporting this growth with new fabrication and coating techniques.


Introduction to Microlithography
By Wayne Pantley and Dave Collier, published in Industrial Laser Solutions, January 1999

Microlithography is a critical technology enabling the manufacture of high density memory and processor chips. A brief background on this technology is followed by a discussion of recent advances in optics and coatings for this demanding application.


Meeting The Challenge Of Deep UV Optics
By Wayne Pantley and Dave Collier, published in Photonics Online, May 1998

From substrate materials through coating technologies, manufacturers of deep-UV laser optics address all aspects of optical coating and fabrication in the ongoing push for longer lifetimes.


Advances In Deep UV Optics
By Wayne Pantley and Dave Collier, published in Laser Focus World, December 1998

The key to certification of long-lived laser optics is independent testing. In this article, recent results from a testing program at MIT Lincoln Labs are reviewed.


Damage Resistant Optics For Excimer Beam Delivery
By David Collier, President, and Wayne Pantley, Director of Sales & Marketing, Alpine Research Optics, Inc., Boulder, CO.

This article reviews several important excimer laser applications, including PRK and microlithography. Optics failure mechanisms are discussed, along with recent developments in thin film testing and deposition technology.